Research Facilities
| Microsystems Design Lab | Design & Simulation Tools | Device Testing Tools |
| Thin Film Laboratory | SNF | Electron Microscope Unit |
| University's Surface Analysis Facilities | ||
Microsystems Design Laboratory
Microsystems Design
Laboratory houses the Computer Aided Design (CAD) facility of the Group.
It has a range of software tools for VLSI design and MEMS design work.
They run either on PCs or the SUN workstations. The software include
Mentor Graphics Tools for VLSI design, PSPICE for circuit simulation,
MEMCAD and ANSYS tools for MEMS design.
Design
and Simulation Tools:
3 Sun Ultra10 workstations running Solaris 7 system
Software:
Mentor Graphics (VLSI design)
ANSYS (finite element simulation)
Microcosm MemCad (MEMS design)
Several Pentium
PCs
Software:
MicroSim PSpice (circuit simulation)
Magic (IC layout)
Device
Testing Tools:
Karl Suss Probing Station
Kulicke&Soffa Wire Bonding Machine
Standard electronic device testing equipment (CROs, signal generators,
power supplies, etc. )
Fabrication Facilities
Thin Film Laboratory
Also referred to as the Plasma Lab, since it's key experimental tool is low-temperature plasma processing, with the following items of equipment (all built in-house):- Plasma Enhanced Chemical Vapour Deposition System (PECVD)
- Hot-Wire CVD (in construction)
- Reactive Ion Etching System
- Sputtering System
- Vacuum Evaporator
Semiconductor Nanofabrication Facility (SNF)
The SNF (Semiconductor
Nanofabrication Facility) is a joint facility between the School
of Electrical Engineering and Telecommunications and the School of Physics.
It houses some of the most advanced equipment for the fabrication of
nanostructures and is the key facility for the Quantum Computer work
(see also Centre
for Quantum Computing ). The two storey complex has 400 m2
of clean-room area. Each floor has a vertical laminar flow Class
3.5 clean-room (white) area and an adjacent Class 350 clean-room (grey)
area. The ground floor white area houses the Leica EBL100 electron
beam lithography system, UV aligners, evaporators and other processing
equipment for GaAs and nanostructures work. The first floor houses
an extensive line of equipment for silicon microelectronics/MEMS processing:
diffusion/oxidation furnaces, wet processing, optical lithography, UV
aligners, chemical vapour deposition systems, reactive ion etching systems,
evaporators. A comprehensive toxic gas handling system for the
CVD and etching systems have also been installed.
Electron Microscope Unit
For details visit the Electron Microscope Unit Home Page.